Difference between revisions of "280G F12"
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+ | [http://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=661228&contentType=Journals+%26+Magazines&searchField%3DSearch_All%26queryText%3DThe+physical+and+electrical+effects+of+metal-fill+patterning+practices+for+oxide+chemical-mechanical+polishing+processes The physical and electrical effects of metal-fill patterning practices for oxide chemical-mechanical polishing processes] | ||
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Revision as of 21:13, 19 October 2012
This quarter, we will put a focus on resonant and non-traditional clocking. We will have two presenters each day -- about 30-40 min each. Please select papers on either distributed/monolithic LC, rotary clocking, or standing wave clocking or similar non-traditional clocking papers.
Date | Presenter | Topic/Paper |
---|---|---|
10/03/12 | Raj,Blake,Seokjoong | VLSI-SOC Dry Run ** Will need to start at 10:30am sharp |
10/10/12 | NONE (VLSI-SoC) | |
10/17/12 | NONE (Matt at NSF) | |
10/24/12 | Matt | How to review papers, Read the clock survey I wrote |
10/31/12 | Raj, Jeff | |
11/07/12 | NONE (Matt at ICCAD) | |
11/14/12 | Ben, Riadul | |
11/21/12 | Bin, Nihan | |
11/28/12 | Hany, Rafael | |
12/05/12 | Elnaz, Nihan |
Papers:
Uniform-phase uniform-amplitude resonant-load global clock distributions
Resonant clocking using distributed parasitic capacitance,
Jitter Characteristic in Charge Recovery Resonant Clock Distribution,
Design of resonant global clock distributions
Resonant-Clock Latch-Based Design
SSTA:
Implementation: